LW400T Large Platform Limited Remote Chip Inspection Metallographic Microscope
LW400T is widely used for observing transparent, semi transparent, or opaque substances. This instrument is equipped with a large moving range stage, a falling beam illumination device, a flat field metallographic objective lens, a large field eyepiece, clear images, good contrast, and a polarizing device. It is specially designed and manufactured for detecting wafers.
Standard configuration
eyepiece |
Wide field of view WF10X (Φ 18mm) |
objective |
Long distance flat field achromatic objective lens (without cover glass) PL 5X/0.12 |
Long distance flat field achromatic objective lens (without cover glass) PL L10X/0.25 | |
Long distance flat field achromatic objective lens (without cover glass) PL L20X/0.40 | |
Long distance flat field achromatic objective lens (without cover glass) PL L40X/0.60 | |
Long distance flat field achromatic objective lens (without cover glass) PL L80X/0.80 | |
eyepiece tube |
Triple eyepiece, tilted at 30 degrees, (with built-in polarizer, switchable) |
Falling light illumination system |
6V 20W halogen lamp, adjustable brightness |
Illuminator with field of view light barrier, aperture light barrier, polarizing film, (yellow, blue, green) color filter, and frosted glass | |
Focuser |
Stage lifting and lowering, coarse and fine coaxial focusing, fine grid value of 0.7 μ m, adjustable coarse and fine tension, with locking and limiting devices |
converter |
Five hole (outward facing ball and inward positioning) |
stage |
Three layer mechanical mobile size: 280mmX270mm, movement range: 204mmX204mm |